Experimental and theoretical study of physical mechanisms governing oxide-based Resistive Memory devices operation
Post-doc starting date: mid 2011 (flexible); Duration: 1 year
The Applicants :
The Post-Doc is open to highly talented and motivated students having a PhD degree. Candidates with a strong background in physics of semiconductors, microelectronics, electrical measurements are encouraged to apply. Applicants should have spent part or the entire university cursus outside of France, and must be fluent in English language.
The Post-Doc Topic Description:
Context - The
ITRS (International Technology Roadmap for Semiconductors) pushes
toward the development of new microelectronic devices based on original
physical mechanisms, offering new memory functions and optimized
performances. In particular, recently, resistive memories (RRAM) have
attracted a lot of attention: a commutation effect inside metal oxides
is responsible for the switching between a low and a high resistance
state and suitable for non volatile memory applications. However, the
basic physical mechanisms at the heart of this type of resistive
memories are still unclear and controversial. Various mechanisms are
invoked to describe the resistive switching: phonon assisted tunnelling,
creation and annihilation of one or several conductive filaments,
oxygen diffusion assisted by an electric field, electrode solubility
etc. Thus the understanding has to be largely improved in order to
sustain the development of this new technology.
Post-Doc work - The aim of the postdoctoral
position will be to couple an experimental and theoretical study of the
physical mechanisms governing the Resistive switching memory operation.
The candidate will have two tasks: (1) electrical characterization and
(2) physical simulations of the memory devices. In particular:
1) The
candidate will analyze the performances of the memory samples using
electrical characterization setups (located both in CEA-LETI and in
IMEP-LAHC) at the state of the art. In particular, a strong attention
will be devoted to the evaluation of switching power versus retention
compromise, necessary before Resistive switching memories could be put
in production. These measurements of memory will be associated with the
material features, obtained in collaboration with the characterization
laboratory, and using a panel of physical characterization techniques
(XRR, XRD, XPS, SIMS, MIR, TEM/EELS).
2) Then the experimental
results will be coupled with an in depth theoretical study, comprising:
-
Ab initio simulations in combination with Molecular Dynamics to study
the “on-state’ to “off-state” switching. In particular, formation and
disruption processes of the filament will be addressed, by studying
anions and cations migration inside the oxide matrix. The role of
electrodes and Oxygen charge effects will also have to be clarified.
Finally the activation energy for this switching will have to be
evaluated to analyze the reliability and retention issue.
- Based on
this previous study at the atomistic scale, a multi physical model will
be developed, including the top and bottom electrodes for the
switching, with expectation in providing a guiding principle for the
combination of RRAM oxides and electrodes.
The studied memory
devices will be processed at CEA LETI MINATEC, investigating various
technological configurations: insulator and electrodes materials,
process conditions.
The Post-Doc Framework
The Post-Doc will be founded by the Nanosciences Foundation in the frame of the Prof. Nishi Chair of Excellence Project. The Prof. Nishi Chair of Excellence Project deals with Resistive Memory Devices and aim to bring an important contribution to resistive memory technology assessment for new applications, especially for reconfigurable circuits, through the establishment of reliable electrical characterization methodologies, reliable physical models of switching elements for circuit design, proposition of reprogrammable circuits implementing resistive switching elements, proposition of new circuit architectures implementing nanoscale switching elements. The combination of the technological know-how and facilities of Leti, the electrical characterization knowledge of IMEP-LAHC with the scientific expertise of Prof. Nishi from Stanford University will allow to reach those targets.
The Laboratory
Under the direction of Prof. Nishi, the PhD work will be performed in the Advanced Memory Technologies Laboratory of CEA-LETI (http://www-leti.cea.fr/en), a world leader laboratory in the creation and transfer of innovation from technologies to applications within Europe. The student will work in strict collaboration with the IMEP-LAHC academic laboratory (http://imep-lahc.grenoble-inp.fr/index.jsp). LETI and IMEP-LAHC are part of the Grenoble MINATEC innovation campus (http://www.minatec.com/en), which is home to 2,400 researchers, 1,200 students, and 600 technology transfer experts on a state-of-the-art 20-hectare campus offering 10,000 square meters of clean room space. MINATEC is located in the Grenoble-Isère French region, otherwise known as France’s Silicon Valley, A unique scientific, industrial and cultural environment, With its research centers, university campus, 500 foreign companies and 40,000 scientists, engineers and technicians employed in the area.
The Post-Doc Advisors
Prof. NISHI Yoshio
Stanford University
(650) 723-9508
Email: Yoshio.nishi@stanford.edu
Dr. MOLAS Gabriel
Advanced Memory Technology Laboratory
CEA
LETI MINATEC Campus
17 rue des Martyrs, 38054 Grenoble CEDEX 9
+33
4 38 78 92 56
Email : gabriel.molas@cea.fr
Dr. BLAISE Philippe
Laboratory of Simulation and Modeling
CEA
LETI MINATEC Campus
17 rue des Martyrs, 38054 Grenoble CEDEX 9
+33
4 38 78 48 94
Email : philippe.blaise@cea.fr
Prof. GHIBAUDO Gérard
IMEP-LAHC MINATEC Campus
+33 4 38 78 48
94
Email : ghibaudo@minatec.inpg.fr






